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M. S. Sonawane1 , R. S. Patil2
Section:Research Paper, Product Type: Isroset-Journal
Vol.7 ,
Issue.1 , pp.42-45, Feb-2019
CrossRef-DOI: https://doi.org/10.26438/ijsrpas/v7i1.4245
Online published on Feb 28, 2019
Copyright © M. S. Sonawane , R. S. Patil . This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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IEEE Style Citation: M. S. Sonawane , R. S. Patil, “Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances,” International Journal of Scientific Research in Physics and Applied Sciences, Vol.7, Issue.1, pp.42-45, 2019.
MLA Style Citation: M. S. Sonawane , R. S. Patil "Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances." International Journal of Scientific Research in Physics and Applied Sciences 7.1 (2019): 42-45.
APA Style Citation: M. S. Sonawane , R. S. Patil, (2019). Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances. International Journal of Scientific Research in Physics and Applied Sciences, 7(1), 42-45.
BibTex Style Citation:
@article{Sonawane_2019,
author = {M. S. Sonawane , R. S. Patil},
title = {Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances},
journal = {International Journal of Scientific Research in Physics and Applied Sciences},
issue_date = {2 2019},
volume = {7},
Issue = {1},
month = {2},
year = {2019},
issn = {2347-2693},
pages = {42-45},
url = {https://www.isroset.org/journal/IJSRPAS/full_paper_view.php?paper_id=1125},
doi = {https://doi.org/10.26438/ijcse/v7i1.4245}
publisher = {IJCSE, Indore, INDIA},
}
RIS Style Citation:
TY - JOUR
DO = {https://doi.org/10.26438/ijcse/v7i1.4245}
UR - https://www.isroset.org/journal/IJSRPAS/full_paper_view.php?paper_id=1125
TI - Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances
T2 - International Journal of Scientific Research in Physics and Applied Sciences
AU - M. S. Sonawane , R. S. Patil
PY - 2019
DA - 2019/02/28
PB - IJCSE, Indore, INDIA
SP - 42-45
IS - 1
VL - 7
SN - 2347-2693
ER -
Abstract :
All Nickel Sulphide thin films were deposited onto the stainless steel substrate by modified chemical bath deposition method. The structural, surface morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry and galvanostatic charge-discharge method. The NiS electrode exhibits a good cycling performance. The specific capacitance of 353 Fgm-1 has been obtained in 2 M KOH solution at a scan rate 50 mVs-1 within the potential range 0 to 0.8 V Vs Ag/AgCl. In charge-discharge behaviors, the maximum energy density (E) of 11.7 Whkg-1 and power density (P) of 4.3 kWkg-1 was obtained at a current density 1 mA/cm2. Impedance spectroscopic analysis revealed that the ESR is 5 Ω in KOH electrolyte.
Key-Words / Index Term :
Nickel Sulphide (NiS), Thin films, Cyclic voltammetry, Supercapacitor, Charge-discharge
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