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CVD Diamond Incubation on SnO2 Coated Silicon Substrate
J.R. Mahajan1
Section:Research Paper, Product Type: Journal-Paper
Vol.9 ,
Issue.1 , pp.11-13, Feb-2021
Online published on Feb 28, 2021
Copyright © J.R. Mahajan . This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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IEEE Style Citation: J.R. Mahajan, “CVD Diamond Incubation on SnO2 Coated Silicon Substrate,” International Journal of Scientific Research in Physics and Applied Sciences, Vol.9, Issue.1, pp.11-13, 2021.
MLA Style Citation: J.R. Mahajan "CVD Diamond Incubation on SnO2 Coated Silicon Substrate." International Journal of Scientific Research in Physics and Applied Sciences 9.1 (2021): 11-13.
APA Style Citation: J.R. Mahajan, (2021). CVD Diamond Incubation on SnO2 Coated Silicon Substrate. International Journal of Scientific Research in Physics and Applied Sciences, 9(1), 11-13.
BibTex Style Citation:
@article{Mahajan_2021,
author = {J.R. Mahajan},
title = {CVD Diamond Incubation on SnO2 Coated Silicon Substrate},
journal = {International Journal of Scientific Research in Physics and Applied Sciences},
issue_date = {2 2021},
volume = {9},
Issue = {1},
month = {2},
year = {2021},
issn = {2347-2693},
pages = {11-13},
url = {https://www.isroset.org/journal/IJSRPAS/full_paper_view.php?paper_id=2299},
publisher = {IJCSE, Indore, INDIA},
}
RIS Style Citation:
TY - JOUR
UR - https://www.isroset.org/journal/IJSRPAS/full_paper_view.php?paper_id=2299
TI - CVD Diamond Incubation on SnO2 Coated Silicon Substrate
T2 - International Journal of Scientific Research in Physics and Applied Sciences
AU - J.R. Mahajan
PY - 2021
DA - 2021/02/28
PB - IJCSE, Indore, INDIA
SP - 11-13
IS - 1
VL - 9
SN - 2347-2693
ER -
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Abstract :
Substrate treatment affects the nucleation and growth of the diamond films. In the case of silicon substrate the scratching of the sample with diamond paste is popular process. In the present study efforts were taken to study incubation period of diamond deposition before actual starting of diamond crystallites. The SnO2 is used as overlayer on the pre-scratched Si substrate. The deposited samples were characterised by Scanning electron Micrograph and Raman Spectra.
Key-Words / Index Term :
HFCVD, Incubation Period, SnO2, Diamond, Pre-scratching
References :
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[7]. J. R. Mahajan, M. A. More, P. P. Patil, S. R. Sainkar. “Influence of SnO2 over layer on nucleation and growth of diamond films on silicon substrate” Materials Science and Engineering: B 97 (2), 117-122, 2003.
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