Development of Experimental Setup for Plasma Facilities at SVITS

Uttam Sharma¹ , Sachin Singh Chauhan² , A. K. Sanyasi³ , K K Choudhary⁴ , Jayshree Sharma⁵ , J. Ghosh⁶

Section:Research Paper, Product Type: Isroset-Conference
Vol.3 , Issue.1 , pp.22-26, Jan-2015

Online published on Feb 28, 2015

Copyright © Uttam Sharma, Sachin Singh Chauhan, A. K. Sanyasi, K K Choudhary, Jayshree Sharma , J. Ghosh . This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
 

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Abstract :
Plasma is a highly conductive partially ionized gas that contains positive & negative ion Species and neutrals. It is the forth state of matter. Plasma processing is used in many areas like Subsurface Modification, Surface Activation, Plasma Enhanced Physical Vapour Deposition, Thin Film coating, Nitriding, Nanoparticles composition, microelectronic fabrication, and textile Plasma treatment. A system has been designed, fabricated and installed in SVITS, Indore for producing different Plasma through Plasma Enhanced Chemical Vapor Deposition (PE-CVD) technique and dc glow discharge for different plasma applications. The system contains a vacuum chamber, a turbo-molecular pump, two electrodes, vacuum gauges, mass analyzer, mass flow controllers and a RF & DC power supply for producing the plasma using hydrogen argon, Nitrogen, Oxygen gases. Different application can also be performed through some modification in the system like Nanoparticles composition, microelectronic fabrication. The system is integrated at SVITS and a vacuum of the order of 3*10-6 mbar is achieved and glow discharge plasma has been created to test all the sub-systems. The system design with all sub-system specifications and Coating by PECVD, and Plasma Textile Treatment will be broadly presented in this paper.

Key-Words / Index Term :
Plasma, PE-CVD, DC-RF Glow Discharge, Textile plasma

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